FASH 173 Apparel Studio I Using designs developed in Fashion Design Studio I, students will explore the two- and three-dimensional patternmaking approach to garment design in this introductory course. Using basic patterns and introductory draping techniques, students develop original design concepts through pivot, slash and spread, and contouring techniques. Through critiqued design development on the dress form, students develop a sense of proportion, silhouette, line and style, while exploring current market trends. Projects are evaluated on professional models for fit and style.